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  • GF101 / GF121 / GF126
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  • Flow rates up to 300 slpm
  • 1% accuracy
  • Corrosion resistant hastelloy C-22 sensor tube
  • Metal seal
  • Less than 1 second response time
  • Control range: 5-100% (normally closed valve)
  • Pressure Transient Insensitivity (PTI)
An engineer will contact you regarding your application data prior to final processing of any Brooks Instrument order.

The Brooks GF101 / GF121 / GF126 Mass Flow Controllers are designed for semiconductor, MOCVD, and other gas flow control applications that require a high purity all-metal flow path. The GF101/ GF121 / GF126 support flow rates up to 300 slpm N2 equivalent. The high flow design utilizes the GF sensor design and electronics. This high flow product provides excellent flow stability for purge lines in CVD, LPCVD, Diffusion, Epi processes, semiconductor chamber clean processes, and MOCVD purge flows.

Applications for the GF101 / GF121 / GF126 Flow Controllers include:

  • Semiconductor etch tools
  • Thin-film chemical vapor deposition systems (CVD, MOCVD, PECVD, ALD)
  • Physical vapor deposition (PVD) systems
  • Epitaxial process systems